Thin Film Formation Technology

Academic year

2025Year

Term

First Semester

Course title

Thin Film Formation Technology

Class type

Lecture

Course title (ENG)

Thin Film Formation Technology

Class code・Class name・Teaching forms

Z0800001 Thin Film Formation Technology

Instructor

TAKANO Ichiro

Credits

2.0Credits

Day and Time

Tue.5Period

Campus

Hachioji Campus

Location

1E-106講義室

Relationship between diploma policies and this course

A) A high degree of specialized expertise　100%
B) The skills to use science and technology　0%
C) The ability to conduct research independently, knowledge pertaining to society and occupations, and sense of ethics required of engineers and researchers　0%
D) Creative skills in specific areas of specialization　0%

Goals and objectives

Thin films using the vacuum technology do play an important role to downsize　personal computers or mobile phones. The subject of this lecture is the study of the vacuum and the thin film deposition technology supporting one of the most advanced areas of engineering. Topics include basic vacuum engineering, evaporation (resistive, electron beam, laser ablation), sputtering (d.c., r.f.) and chemical vapor deposition. The mechanisms of each process are explored and thin film growth models are also explained.

Prerequisites

The basic knowledge of physics and chemistry is required in this subject.

Method Using AL・ICT

Support for self-learning using ICT

Class schedule

１．Introduction (1): Thin films? Vacuum?
２．Introduction (2): Methods of producing thin films. Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD).
３．Basics of vacuum engineering.
４．Measurement of vacuum: Penning, Pirani and ionization gauges.
５．Creation of vacuum: Rotary, diffusion, getter ion, turbo molecular and cryo pumps.
６．Designing a typical vacuum system. Residual gas and mean free path in vacuum.
７．Vacuum evaporation: Thin-film nucleation and growth on a substrate surface.
８．Laboratory: Thin metal film deposition by thermal vacuum evaporation.
９．Mechanism of sputtering
10．Sputtering using a d.c. and r.f. power supply. Apparatus and applications.
11．Ion implantation and ion beam application.
12．Mechanism of Chemical Vapor Deposition (CVD) and apparatus.
13．Characterization of thin films: Thin film analysis. Electrical, mechanical and optical property.
14．Final exam.
15．Reconfirmation of the learning.

Evaluation

Final exam (70%) and short reports of every week (30%).

Feedback for students

Explanatory materials will be provided on demand at the end of all programs.

Textbooks

Materials used in class will be distributed by KU-LMS.

Reference materials

例えば
「薄膜作成の基礎」麻蒔立男著，日刊工業新聞社
「ドライプロセスによる表面処理・薄膜形成の基礎」表面技術協会編，コロナ社

Office hours and How to contact teachers for questions

If you have any questions, please contact us via KU-LMS.

Message for students

Thin films using vacuum support the most advanced technology of many branches for optical devices, mirrors, semiconductor devices, magnetic media, food wrap, etc. This class provides interdisciplinary knowledge.

Course by professor with work experience

Not applicable

Work experience and relevance to the course content if applicable

Teaching profession course

Electrical Engineering and Electronics Program

Syllabus data